Research Article
Growth of MWCNTs on Plasma Ion-Bombarded Thin Gold Films and Their Enhancements of Ammonia-Sensing Properties Using Inkjet Printing
Table 1
Sputtered conditions for deposition of Al2O3 and Au films.
| Parameters | Al2O3 film | Au film |
| Base pressure (mbar) | 5 × 10−5 | 5 × 10−3 | Working pressure (mbar) | 3 × 10−3 | 1 × 10−1 | Substrate temperature (°C) | R.T | R.T | Distance between the target and the substrate (cm) | 10 | 5 | Ar flow rate (sccm) | 5 | 5 | O2 flow rate (sccm) | 1 | — | DC power (W) | 216 | 20 | Sputtering time (s) | 60 | 30 |
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