International Journal of Chemical Engineering

Research Article

Modified t-Distribution Stochastic Neighbor Embedding Using Augmented Kernel Mahalanobis-Distance for Dynamic Multimode Chemical Process Monitoring

Table 2

Disturbances in the TE process.
No.Variable descriptionType
IDV (1)A/C feed ratio, B composition constantStep
IDV (2)B composition, A/C feed ratio constantStep
IDV (3)D feed temperatureStep
IDV (4)Reactor cooling water inlet temperatureStep
IDV (5)Condenser cooling water inlet temperatureStep
IDV (6)A feed lossStep
IDV (7)C Header pressure loss-reduced availabilityStep
IDV (8)A, B, C feed compositionRandom
IDV (9)D feed temperatureRandom
IDV (10)C feed temperatureRandom
IDV (11)Reactor cooling water inlet temperatureRandom
IDV (12)Condenser cooling water inlet temperatureRandom
IDV (13)Reaction kineticsSlow drift
IDV (14)Reaction kineticsSticking
IDV (15)Condenser cooling water valveSticking
IDV (16)UnknownUnknown
IDV (17)UnknownUnknown
IDV (18)UnknownUnknown
IDV (19)UnknownUnknown
IDV (20)UnknownUnknown