Research Article
A Two-Phase Pattern Generation and Production Planning Procedure for the Stochastic Skiving Process
Algorithm 1
The two-phase solution methodology.
| (1) | START; | | (2) | Determine parameter values and descriptors; | | (3) | Set , , ; | | (4) | Run the DA to generate the pattern set that has a minimum trim loss; | | (5) | Run the SAA submodule; | | (6) | while do | | (7) | while do | | (8) | Run the DA to generate the additional pattern set that has a minimum trim loss; | | (9) | ; | | (10) | solve deterministic min SSP using ; equations (18)–(22); | | (11) | Compute | | (12) | end | | (13) | Set minimal proper pattern pool ; | | (14) | , ; | | (15) | Run the SAA submodule (Section 4.2); | | (16) | end | | (17) | STOP; | | (18) | SAA Submodule | | (1) | Run the SAA (Section 4.2), , equation (30), using or if available, ; | | (2) | Obtain candidate production amounts for each sample; , ; | | (3) | Select maximum production amount for each product; ; | | (4) | Compute using step size; , + ; | | (5) | Solve deterministic min SSP using ; ; | | (6) | Compute ; | | (7) | end |
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