Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials

Table 1

Characteristics of most popular lithographic techniques [7, 13, 19, 20].

Technique	Minimum feature size	Pattern	Area	Cost	Time	Use
Deep UV L. [21]	≅50–100 nm	PW	Large	High	Short	Industry
Immersion deep UV L. [22]	≅30 nm	PW	Large	High	Short	R & D
Extreme UV L. [23]	<50 nm	PW	Large	High	Short	R & D
X-Ray L.	≅20 nm	PW	Large	High	Short	R & D
Electron Beam L.	≅ nm	SW	Small	High	Long	R & D (industry)
Soft L. [11]	≅10 nm	PW	Large	Low	Short	R & D (industry)
Scanning Probe L. [16]	<1 nm	SW	Small	High	Long	R & D

L.: lithography; PW: parallel writing; SW: sequential writing.