Review Article
Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials
Table 1
Characteristics of most popular lithographic techniques [
7,
13,
19,
20].
| Technique | Minimum feature size | Pattern | Area | Cost | Time | Use |
| Deep UV L. [21] | ≅50–100 nm | PW | Large | High | Short | Industry | Immersion deep UV L. [22] | ≅30 nm | PW | Large | High | Short | R & D | Extreme UV L. [23] | <50 nm | PW | Large | High | Short | R & D | X-Ray L. | ≅20 nm | PW | Large | High | Short | R & D | Electron Beam L. | ≅ nm | SW | Small | High | Long | R & D (industry) | Soft L. [11] | ≅10 nm | PW | Large | Low | Short | R & D (industry) | Scanning Probe L. [16] | <1 nm | SW | Small | High | Long | R & D |
|
|
L.: lithography; PW: parallel writing; SW: sequential writing.
|