Review Article

Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials

Figure 5

(a) SEM micrograph of a PS monolayer (480 nm diameter) containing defects of multilayers and voids. “Reprinted with permission from [53]. Copyright (1996) American Chemical Society.”; (b) Tapping-mode atomic force microscopy micrograph of PS monolayer. “Reprinted with permission from [54]. Copyright (2000) American Institute of Physics.”
948510.fig.005