Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials

Figure 18

SEM micrographs of a PS mask annealed in water/EtOH/acetone mixture by (a) 1, (b) 2, and (c) 4 microwave pulses. The scale bar is 200 nm. “Reprinted with permission from [117]. Copyright (2005) John Wiley and Sons.”