Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering
Figure 3
(a) Photograph of 4′′ bulk silicon wafer (top) and a monolayer array of 550 nm nanospheres that were deposited on a 4 inch silicon wafer (bottom). (b) Close view of a monolayer nanosphere on Si wafer; ((c)–(f)) NPSiS with different dry etching times: (c) NPSiS-1, 80 s (depth: 180 nm), (d) NPSiS-2, 150 s (depth: 270 nm), (e) NPSiS-3, 230 s (depth: 370 nm), and (f) NPSiS-4, 450 s (depth: 550 nm).
