TY - JOUR
A2 - Brus, Viktor
AU - Tseng, Shao-Ze
AU - Lin, Chang-Rong
AU - Wei, Hung-Sen
AU - Chan, Chia-Hua
AU - Chen, Sheng-Hui
PY - 2014
DA - 2014/06/15
TI - Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering
SP - 707543
VL - 2014
AB - This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si : H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.
SN - 1110-662X
UR - https://doi.org/10.1155/2014/707543
DO - 10.1155/2014/707543
JF - International Journal of Photoenergy
PB - Hindawi Publishing Corporation
KW -
ER -