Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films

<table>Effect of <svg height="13.7625" id="M103" style="vertical-align:-4.83345pt" version="1.1" viewbox="0 0 38.150002 13.7625" width="38.150002" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg> on the optical band gap of the film: (a) direct band gap <svg height="18.3125" id="M104" style="vertical-align:-5.73161pt" version="1.1" viewbox="0 0 23.25 18.3125" width="23.25" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg>; (b) indirect band gap <svg height="18.3125" id="M105" style="vertical-align:-5.73161pt" version="1.1" viewbox="0 0 20.3125 18.3125" width="20.3125" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg>.</table>

International Journal of Antennas and Propagation

fig8

Figure 8

Figure 8: Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films 