Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials

Table 1

Experimental conditions of gas phases syntheses.

No., Ln	𝑇1 (H2Carb^′), ^°C	𝑇2 (Ln(dpm)3), ^°C	𝑚1 (H2Carb^′), g	𝑚2 (Ln(dpm)3), g	Product assignment
		H2Carb^′ = H2tph
1, Eu	160	250	0.58	0.075	N/A
2, Eu	160	300	0.71	0.068	i film
3, Tb	160	300	0.82	0.097	ii film
		H2Carb^′ = H2nda
4, Eu	160	370	0.50	0.500	iii film